| 摘要 |
PURPOSE: To provide a photosensitive composition capable of forming a fine pattern by the sililating method and to provide a fine pattern forming method with it. CONSTITUTION: A compound accelerating sililation on a photosensitive resin contains a compound expressed by the formula and having two or more hydroxy groups in the molecule or a light base generating agent generating a base by exposure. The sililation of the exposure section or nonexposure section of the photosensitive resin is accelerated by exposure, the etching resistance by oxygen plasma is improved, the contrast of a pattern is made clear, and the fine pattern can be formed. |
