发明名称 IMPLANT SURFACE PREPARATION
摘要 <p>The present invention relates to processes for improving the surfaces of devices to be surgically implanted in living bone, and to implant devices having the improved surfaces. A titanium body (10) which has been exposed to air has on it an oxide layer (14) of an oxide or oxides of titanium which forms naturally. The oxide layer (14) is typically of a thickness in the range of 70 Angstroms to 150 Angstroms. To render the titanium body (10) better suited for implantation, the outer surface (12) is grit blasted and then bulk etched with an etching acid to produced an etched area (16) which is free of the oxide layer (14).</p>
申请公布号 WO1996016611(A1) 申请公布日期 1996.06.06
申请号 US1995015576 申请日期 1995.11.30
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址