发明名称 PROCESS FOR PRODUCING AN OXIDE LAYER
摘要 <p>A superficial preoxydation of the substrate (2) is effected by placing it in contact with an oxidant gas excited by a cool plasma of the substrate (2) situated in the flow post-discharge of the cool plasma used to the oxidant element and heated to an oxidation temperature lower than 500 °C. At the surface of the preoxidized substrate (2), a metal oxide is provided by heterogenous oxidation of a metal halide by using a gas mixture comprising an oxidant element activated by a cool plasma. The oxidant gas mixture is set in contact with the halide at the closest vicinity of the substrate arranged in the remote flow post-discharge of the cool plasma. Preferably, the cool plasma is generated by micro-waves. The process may be used particularly for forming a protection coating on a casing tube of a nuclear fuel rod.</p>
申请公布号 WO1996017105(A1) 申请公布日期 1996.06.06
申请号 FR1995001576 申请日期 1995.11.29
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