发明名称 Negative plate used for manufacture of a shadow mask, and method for manufacturing the negative plate
摘要 <p>A printing negative plate for printing aperture patterns on the surface of a mask substrate used to manufacture a shadow mask comprises a larger-opening negative plate (20b) having a large number of larger-opening patterns (21b) corresponding to the larger openings (34) and pasted on one side of the mask substrate (10); and a smaller-opening negative plate (20a) corresponding to the smaller openings (35) and pasted on the other side of the mask substrate (10). Each of the larger and smaller patterns (21b, 21a) have a rectangular main pattern (24a, 24b) and rectangular projecting patterns (25) individually projecting outward from the four corners of the main pattern. &lt;IMAGE&gt;</p>
申请公布号 EP0715331(A2) 申请公布日期 1996.06.05
申请号 EP19960102180 申请日期 1991.11.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHTAKE, YASUHISA;SAGO, SEIJI;MAGAKI, YASUSHI
分类号 H01J9/14;H01J29/07;(IPC1-7):H01J9/14 主分类号 H01J9/14
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