| 发明名称 |
FORMING METHOD OF POSITIVE TYPE RADIATION SENSITIVE MATERIAL LAYER |
| 摘要 |
PURPOSE:To make a manufacturing step together with a coating step to a single and dry integral step in connection with the manufacture of radiation sensitive resist material by plasma-polymerizing hydrocarbon (halide) to a thin film on a substrate plane. |
| 申请公布号 |
JPS53120527(A) |
申请公布日期 |
1978.10.21 |
| 申请号 |
JP19770035705 |
申请日期 |
1977.03.30 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MIYAMURA MASATAKA |
| 分类号 |
G03F7/039;G03C1/00;G03C1/74;G03F7/09;G03F7/16;G03G5/00;H01L21/027;H01L21/302;H05K3/06 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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