发明名称 Process for positioning a mask relative to a workpiece and device for carrying out the process
摘要 When carrying out the alignment process, light from a first and a second irradiation device (1,6) illuminates alignment marks (MAM,WAM) of a mask (M) and a workpiece (W) respectively, the projected images of the alignment marks are recorded, subjected to image processing and relative positions of the corresponding alignment marks are determined and stored. The relative positions of the mask and workpiece alignment marks are computed and the workpiece and/or the mask are/is moved such that the corresponding marks come to rest one on top of the other. Alternatively, actinic light is used to illuminate the alignment marks of a mask and projected onto a reflecting component which is located on the workpiece carrier. After stopping emission of the actinic light, the workpiece is placed on the workpiece carrier and non-actinic light illuminates the alignment marks of the workpiece. The relative positions of the corresponding alignment marks are determined and stored and the workpiece and/or the mask are/is moved such that the corresponding alignment marks come to rest one on top of the other. <IMAGE>
申请公布号 EP0715214(A1) 申请公布日期 1996.06.05
申请号 EP19950118791 申请日期 1995.11.29
申请人 USHIODENKI KABUSHIKI KAISHA 发明人 TANAKA, YONETA
分类号 G03F9/00 主分类号 G03F9/00
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