Exposure apparatus

摘要

An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.