发明名称 |
Microwave energized ion source for ion implantation |
摘要 |
A microwave energized ion source apparatus is supported by a support tube extending into a cavity defined by a housing assembly and includes a dielectric plasma chamber, a pair of vaporizers, a microwave tuning and transmission assembly and a magnetic field generating assembly. The chamber defines an interior region into which source material and ionizable gas are routed. The chamber is overlied by a cap having an arc slit through which generated ions exit the chamber. The microwave tuning and transmission assembly, which feeds microwave energy to the chamber in the TEM mode, includes a coaxial microwave energy transmission line center conductor. One end of the conductor fits into a recessed portion of the chamber and transmits microwave energy to the chamber. The center conductor extends through an evacuated portion of a coaxial tube surrounding the conductor. A vacuum seal is disposed in or adjacent the coaxial tube and from the boundary between the evacuated coaxial tube and a non-evacuated region. The arc slit cap is secured to a chamber housing surrounding the chamber and is adapted to interfit with a clamping assembly secured to an end of the support tube such that the arc slit is aligned with a predetermined ion beam line. The energy transmission center conductor is coupled to a tuning center conductor which is slideably overlied by a pair of slug tuners. Moving the slug tuners along their paths of travel changes an impedance of the microwave energy input to the chamber.
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申请公布号 |
US5523652(A) |
申请公布日期 |
1996.06.04 |
申请号 |
US19940312142 |
申请日期 |
1994.09.26 |
申请人 |
EATON CORPORATION |
发明人 |
SFERLAZZO, PIERO;ROSE, PETER H.;TRUEIRA, FRANK R. |
分类号 |
C23C14/48;H01J27/18;H01J37/08;H01J37/317;H01L21/265;(IPC1-7):H01J7/24 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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