| 摘要 |
<p>PURPOSE: To provide a photosensitive resin composition for color filter capable of producing a color filter having a polychromatic fine pattern on a substrate with an excellent workability and high accuracy, a photosensitive film and the color filter. CONSTITUTION: In the photosensitive resin composition for color filter containing (A) 45-70 pts.wt. film forming polymer copolymerized with 17-30wt.% methacrylic or acrylic acid and having 50,000-150,000 weight average molecular weight, (B) 30-55 pts.wt. ethylenic unsaturated compound (where, the sum of the component (A) and the component (B) is 100 pts.wt.), (C) 0.1-10 pts.wt. photopolymerization initiator and (D) 0.1-50 pts.wt. pigment or dye, the ethylenic unsaturated compound (B) containsγ-chloro-β-hydroxypropyl-β'-methacryloyl oxyethyl-o- phthalate.</p> |
