发明名称 SEMICONDUCTOR MEMORY
摘要 <p>PURPOSE: To prevent influence on reading operation by cutting between a drain and a corresponding data line by a row selecting MOSFET even when the memory cell of a depleted state exists in a column address to be read of a memory array. CONSTITUTION: Row selecting MOSFETNs 0 to Nsm are provided between data lines DO to D7 corresponding to the drains of 2-layer gate structure memory cells Nc0 to Ncm, etc., for forming a memory array of a flash memory, etc. Even when the memory cell of depleted state exists in designated eight data lines DO to D7, i.e., the column address to be read, the data lines corresponding to the drains are cut by the row selecting MOSFET, thereby preventing the influence to the reading operation. Thus, the reading of the flash memory is normalized to enhance the product yield.</p>
申请公布号 JPH08139294(A) 申请公布日期 1996.05.31
申请号 JP19940298861 申请日期 1994.11.07
申请人 HITACHI LTD;HITACHI TOBU SEMICONDUCTOR LTD 发明人 ODAGIRI MICHIKO;TAKAHASHI MASATO
分类号 G11C17/00;G11C16/02;G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 主分类号 G11C17/00
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