| 摘要 |
PURPOSE: To provide a photoresist composition that has high sensitivity, reduces the rate of occurrence of imperfect processing, is excellent in applicability and substantially eliminates the possibility of filter clogging during filtering by containing a specific photosensitive s-triazine compound. CONSTITUTION: This photoresist composition contains a novolac resin, an acid crosslinked compound, propylene glycol monoalkyl ether and/or its ester, and a photosensitive s-triazine compound represented by the formula. In the formula, R1 and R2 each independently represent a haloalkyl or haloalkenyl group having 1 to 3 carbon atoms, R3 represents halogen atom, an alkyl group, a substituted alkyl group or the like, and R4 -R5 each independently represent hydrogen atom, halogen atom, an alkyl group or the like; i.e., the photoresist composition becomes excellent in applicability and substantially eliminates the possibility of filter clogging during filtering by containing as an optical acid generator the photosensitive s-triazine having a specific structure. |
