| 摘要 |
PURPOSE: To improve resist characteristics such as light transmissivity, sensitivity, resolution and etching resistance, etc., by incorporating a polymer containing a specific structural unit and a radiosensitive component producing an acid by being irradiated with activated radioactive ray. CONSTITUTION: This resist composition contains the polymer containing the structural unit expressed by formulae I-III and the radiosensitive component producing the acid by being irradiated with activated radioactive ray. In formulae I-III, each of R<1> -R<3> is individually hydrogen atom, 1-4C substitutable alkyl group, halogen atom, cyano group or nitro group, each of R<4> and R<5> is individually hydrogen atom, 1-8C linear, branched or cyclic substitutable alkyl group, substitutable alkenyl group or substitutable aryl group, Adm is a 1-adamantyl group and R<6> is an acid unstable group. In each formula, (k), (m) and (n) respectively represent the ratio of each structural unit and are 0.05<=k<=0.95, 0.1<=m<=0.95, 0.05<=n<=0.6 in k+m+n=1. |
