| 摘要 |
PURPOSE: To provide a positive photoresist composition that is excellent in safety, is so excellent in application performance that failures such as imperfect application and striations do not arise, is so excellent in the preservation stability of its solution that precipitation or decomposition, etc., of particles of a photosensitizer do not occur during preservation, and is also excellent in heat resistance. CONSTITUTION: This positive photoresist composition contains (a) an alkali- soluble resin; (b) 1,2-naphthoquinonediazide-4-(or/and-5-)-sulfonate; and (c) propylene glycol monoalkyl ether propionate. |
