| 摘要 |
PURPOSE: To provide a resist developing method which has a high in-plane uniformity and a high reproducibility of the accuracy of a resist pattern and a small consumption of a developer and to provide a developing apparatus. CONSTITUTION: While a substrate on which a pattern has been exposed and in which a resist has been formed on the surface is being turned at high speed, the resist is spray-coated with a developer. In succession, while the substrate is being turned at low speed, the developer is dropped and supplied onto the resist so as to swell the developer. After that, the substrate is made to be at a standstill, the developer is held on the surface of the resist, and the resist is developed. In addition, a developing apparatus is provided with a rotating substrate-holding stand whose number of revolutions is variable, with a nozzle which is used to supply a developer onto the face of a resist on a substrate and with a means by which the developer is supplied to the nozzle. The nozzle is provided with a nozzle for spraying and with a nozzle for dropping. |
