发明名称 NON-AMINIC PHOTORESIST ADHESION PROMOTERS FOR MICROELECTRONIC APPLICATIONS
摘要 <p>A method for providing a substrate having improved adherence for polymeric films is disclosed. The method entails reacting at least one organosilane compound having at least one alkylsilyl moiety therein and at least one hydrolyzable group capable of reacting with the substrate to silylate the substrate. Hydrolyzable by-products from the reaction, if any, have a pH less than or equal to about 7.</p>
申请公布号 WO1996015861(A1) 申请公布日期 1996.05.30
申请号 US1995014860 申请日期 1995.11.14
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