| 摘要 |
<p>A method and apparatus are provided for the fine cleaning of a fine thin substrate (2). The apparatus has a transporter (10) capable of moving the substrate through the apparatus by non-fluid contact with the edges of the substrate (2) alone. In a typical embodiment, the transporter (10) is a series of centrally-tapered rollers (28). As the substrate (2) is moved through the apparatus by the transporter (10), its central section is supported by a fluid. Thus, the substrate (2) moves through the apparatus without contact with any solid material except on its edges. As the substrate (2) moves through the apparatus by the transporter (10), fluid ejectors (70, 72, 74) wash the substrate (2) by spraying a cleaning fluid against the substrate (2). After being washed, the substrate (2) is rinsed and dried. Anti-dragout devices (76) are positioned upstream and downstream of the washing (18) and rinsing (20) sections so as to minimize liquid dragout.</p> |
