| 摘要 |
The object of the invention is a process for coating substrates, involving the introduction of the substrate into a vacuum chamber (1) with one or more vaporisation sources; evacuation of the vacuum chamber, heating of the substrates and coating of the substrate using a physical vapour deposition process. The process is characterized by the fact that the vacuum chamber (1) is evacuated solely by one or more backing pumps (4, 5). A further object of the invention is a device for carrying out the said process. |
