| 摘要 |
<p>PURPOSE:To measure a phase value of a shifter portion of a phase shift mask directly with an exposure wavelength. CONSTITUTION:Luminous flux from a KrF laser 2 is divided in two on a clad surface 9 so that individual luminous fluxes reflected on a multiple layer film 8 of an induction body are overlapped on the clad surface 9 to produce an interference light, which is admitted onto a Si photo detector 6. A minimum space is so arranged that an optical path length varying element 3 is buried into one synthetic quartz optical path 1 and a phase shift mask 5 into the other synthetic quartz 1. Thus, a phase shift value with a phase shifter is measured accurately from changes in the intensity of light and shade of an interference portion.</p> |
