发明名称 |
Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom |
摘要 |
The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.
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申请公布号 |
US5521052(A) |
申请公布日期 |
1996.05.28 |
申请号 |
US19940365659 |
申请日期 |
1994.12.30 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
RAHMAN, M. DALIL;AUBIN, DANIEL P.;KHANNA, DINESH N.;MCKENZIE, DOUGLAS |
分类号 |
G03F7/023;C08G8/00;C08G8/04;G03F7/004;H01L21/027;(IPC1-7):G03F7/004;G03F7/30;B01J41/00;C08G8/12 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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