发明名称 Method for forming a field-effect transistor including anodic oxidation of the gate
摘要 An insulated-gate field-effect transistor adapted to be used in an active-matrix liquid-crystal display. The channel length, or the distance between the source region and the drain region, is made larger than the length of the gate electrode taken in the longitudinal direction of the channel. Offset regions are formed in the channel region on the sides of the source and drain regions. No or very weak electric field is applied to these offset regions from the gate electrode.
申请公布号 US5521107(A) 申请公布日期 1996.05.28
申请号 US19940219819 申请日期 1994.03.29
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI, SHUNPEI;MASE, AKIRA;HIROKI, MASAAKI;TAKEMURA, YASUHIKO;ZHANG, HONGYONG;UOCHI, HIDEKI;NEMOTO, HIDEKI
分类号 G02F1/1362;G09G3/36;H01L21/336;H01L21/77;H01L21/84;H01L29/49;H01L29/786;H04N3/12;(IPC1-7):H01L21/265 主分类号 G02F1/1362
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