发明名称 HIGH-TEMPERATURE AND HIGH-VACUUM VESSEL AND JIG
摘要 <p>PURPOSE: To immediately use the vessel and jig to be used under conditions of high temp. and high vacuum without any special pretreatment by pretreating the vessel and jig under conditions of high temp. and high vacuum and then packaging them with a film consisting of a material low in moisture permeabil ity. CONSTITUTION: Tools such as a crucible for molecular beam epitaxy and a boat for metal deposition to be used under conditions of high temp. and high vacuum formed from pyrolytic boron nitride(PBN) and the jig such as a heater, shutter, reflector, tube and pipe are preheated at <=10<-3> Torr and >=800 deg.C for >=1hr, degasified, then sealed and packaged with a material such as polyolefin film vapor-deposited with Al and having <=10g/(cm<2> 24hr) moisture permeability in the atmosphere of an inert gas such as N2 , Ar and He having <=10% relative humidity. The vessel and jig are unpacked at the time of use and immediately used for high-temp. and high-vacuum device without any pretreatment, since the vessel and jig are degasified under conditions of high temp. and high vacuum.</p>
申请公布号 JPH08134633(A) 申请公布日期 1996.05.28
申请号 JP19940280266 申请日期 1994.11.15
申请人 SHIN ETSU CHEM CO LTD 发明人 KIMURA NOBORU;IWAI RYOJI;HIRATA KAZUTO
分类号 B01J3/00;C04B35/583;C23C14/00;C23C14/20;C23C14/24;C30B23/08;(IPC1-7):C23C14/24 主分类号 B01J3/00
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