发明名称 Method for producing metal wirings on an insulating substrate
摘要 A method for producing metal wirings on an insulating substrate is disclosed. The method comprises the steps of forming a metal wiring layer of a predetermined shape on a predetermined position of the insulating substrate, the metal wiring layer being made of a metal capable of being oxidized; implanting the metal wiring layer with an impurity element; and forming an insulating layer by oxidizing the surface of the metal wiring layer after implanting the impurity element.
申请公布号 US5518936(A) 申请公布日期 1996.05.21
申请号 US19950403125 申请日期 1995.03.13
申请人 SHARP KABUSHIKI KAISHA 发明人 YAMAMOTO, TOMOHIKO;SHIMADA, YASUNORI;MORIMOTO, HIROSHI
分类号 G02F1/136;G02F1/1362;G02F1/1365;G02F1/1368;H01L21/265;H01L21/28;H01L21/316;H01L21/3205;H01L21/336;H01L23/52;H01L29/49;H01L29/78;H01L29/786;H01L45/00;H01L49/02;H05K1/03;H05K3/38;(IPC1-7):H01L21/265 主分类号 G02F1/136
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