发明名称 Radiation sensitive compounds
摘要 A radiation-sensitive compound has the general formula <IMAGE> wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus, B represents H, acryl, aroyl, heterocyclyl carbonyl or <IMAGE> R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CHpX3-p, J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substitutent additional to E or G, X represents Cl or Br, and m, n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2. The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.
申请公布号 US5519136(A) 申请公布日期 1996.05.21
申请号 US19920886858 申请日期 1992.05.22
申请人 WADE, JOHN R. 发明人 WADE, JOHN R.
分类号 C07D209/12;C07D215/14;C07D277/64;C07D277/84;C07D293/12;C07D409/06;C07D417/06;G03C1/675;G03F7/029;(IPC1-7):C07D215/12 主分类号 C07D209/12
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