发明名称 Fast atom beam source
摘要 A fast atom beam source is capable of efficiently emitting a fast atom beam with low energy and high particle flux. A plate-shaped electrode has a plurality of atom emitting holes. A pair of electrodes are disposed in series opposite the plate-shaped electrode so as to form an electric discharge part. An AC power supply impresses an AC voltage between the pair of electrodes. A DC power supply impresses a DC voltage between the plate-shaped electrode and one of the pair of electrodes that is closer to the plate-shaped electrode. A gas inlet introduces a gas to induce electric discharge in the space between the plate-shaped electrode and the pair of electrodes.
申请公布号 US5519213(A) 申请公布日期 1996.05.21
申请号 US19940289662 申请日期 1994.08.12
申请人 EBARA CORPORATION 发明人 HATAKEYAMA, MASAHIRO
分类号 H05H3/02;(IPC1-7):H01S1/00;H01S3/00 主分类号 H05H3/02
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