发明名称 PHOTOSENSITIVE BIS(HALOGEN-SUBSTITUTED METHYLOXADIAZOLE) COMPOUND
摘要 <p>PURPOSE: To obtain a photosensitive bis(halogen-substituted methyloxadiazole) compound, having a photosensitive wavelength region in a near ultraviolet to a visible regions and useful as a photosensitive layer, a color proof, a photoresist, etc. CONSTITUTION: A derivative of formula I R<1> is Cn H2n , etc., [(n) is an integer of 1-10]; R<2> and R<3> are each independently H, a 1-10C alkyl, a 1-10C alkoxy, etc.; R<4> and R<5> are each independently H, a 1-10C alkyl, a 6-12C phenyl, etc.; X, Y and Z are each independently H or a halogen (except the case where X, Y and Z are H)}, e.g. a compound of formula II (R<1> is C4 H8 , etc.). The compound of formula I is obtained by cyclizing, e.g. a bis type N-cinnamoyl-N'- haloacetylhydrazine of formula III. The compound of formula I has high sensitivity without causing coloring of decomposed substances in exposure to light or preservation in the light.</p>
申请公布号 JPH08127571(A) 申请公布日期 1996.05.21
申请号 JP19950038743 申请日期 1995.02.27
申请人 FUJI PHOTO FILM CO LTD 发明人 YUMOTO MASATOSHI;YANAGIHARA NAOTO;IWAKURA KEN
分类号 G03F7/029;C07D271/10;(IPC1-7):C07D271/10 主分类号 G03F7/029
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