发明名称 Pressure-connection type semiconductor device having a thermal compensator in contact with a semiconductor base substrate in an alloy-free state
摘要 In order to obtain a pressure-connection type semiconductor device while preventing misregistration of a semiconductor base substrate and a thermal compensator with no penetration of an insulating/holding material and a method suitable for fabricating this device, concentric first and second steps (31c, 31a) are provided on an upper major surface of a first thermal compensator (31) from its outer periphery toward the center. A corner groove (3b) is provided along the overall periphery of an inner comer of the first step (31c), in the form of a ring. Since no insulating/holding material is provided in a contact surface between the semiconductor the substrate and the thermal compensator, the semiconductor base substrate and the thermal compensator are maintained in excellent electrical contact while no local stress is applied to the semiconductor substrate when the same is brought into pressure contact with the thermal compensator.
申请公布号 US5519231(A) 申请公布日期 1996.05.21
申请号 US19940340382 申请日期 1994.11.15
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 NAKASHIMA, NOBUHISA;SAKAMOTO, TOKUMITSU;KONISHI, YUZURU
分类号 H01L29/74;H01L21/52;H01L23/051;H01L23/31;(IPC1-7):H01L23/42 主分类号 H01L29/74
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