发明名称 RADIATION SENSITIVE COMPOSITION
摘要 PURPOSE: To improve adhesion to a substrate, to extend processing latitude and to enable development with an aq. alkali soln. by incorporating a binder, a dissolution inhibitor, a photosensitive compd., a base, etc., specified respectively. CONSTITUTION: This radiation sensitive compsn. contains a binder insoluble in water but soluble or swellable in an aq. alkali soln., a dissolut. inhibitor, a photosensitive compd. which generates an acid by exposure with active radiation, a base which is degraded to a neutral compd. by the same exposure and a phenolic compd. represented by the formula (where R is 1-12C alkyl, etc., and A is a 1-100C alicyclic group). The dissolution inhibitor is made of poly(N,O- acetal) represented by the formula (-CHR<3> -O-R<4> -X-NR<5> -)p (where R<3> is alkyl, aryl, etc., R<4> is divalent alkylene, cycloalkylene, etc., R<5> is alkyl, alkene, etc., and X is -OCO-, -CO-, etc.) and/or a phenolic compd. having a hydroxyl group protected with a group which is cleaved by an acid.
申请公布号 JPH08129260(A) 申请公布日期 1996.05.21
申请号 JP19940269579 申请日期 1994.11.02
申请人 HOECHST JAPAN LTD 发明人 MUNIRACHIYUNA PADOMANABAN;SUEHIRO NATSUMI;KINOSHITA YOSHIAKI;FUNATO SATORU;MASUDA SEIYA;OKAZAKI HIROSHI;GEORUGU PAUROUSUKI
分类号 G03F7/00;G03F7/004;G03F7/033;G03F7/039;G03F7/085;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/00
代理机构 代理人
主权项
地址