FORMATION OF FILM AND FILM FORMING DEVICE

摘要

PURPOSE: To provide a method for forming a film in which the formation of a film of high quality free from the incorporation of impurities and free from the generation of voids is enabled at a high speed and to provide a film forming device therefor. CONSTITUTION: The method for forming a film in which raw material fine powder is introduced to the inside of a plasma generating part 3 made of a quartz tube 4 and in which coils 5 applied with high frequency voltage are arranged around the same via a carrier gas constituted of an inert gas. Based on the energy of plasma in the plasma generating part 3 confined by a gas for cooling flowed around the same, the state of the raw material fine powder is formed into a molten one, which is jetted onto a substrate 12 set in an atmosphere of an inert gas, and film deposition is executed to the substrate 12, and the film forming device therefor are provided.