| 摘要 |
PURPOSE: To provide an ionizing radiation-sensitive resin compd. for superfine processing having high sensitivity, high resolution and good balance in other resist properties, and small dependence of the resolution on film thickness. CONSTITUTION: In this ionizing radiation-sensitive resin compd. containing a water-insoluble and alkali-soluble resin and an ionizing radiation-sensitive compd., the ionizing radiation-sensitive compd. contains at least one kind of quinone diazide sulfonate of a polyhydroxy compd. having a substituent expressed by the formula -X-R. In the formula, X is -NHSO2 -, -CONHSO2 -, -NHCONHSO2 or -NHSO2 NHCO-, R is an alkyl or subtd. alkyl group, aryl group or substd. aryl group. |
