| 摘要 |
A process is provided for determining the concentration of a gas in a molten metal by a carrier gas, which can be pumped to at least one analyzer, either in direct route for calibration, or for measuring through a measuring circuit with a measuring probe immersed in the molten metal, wherein the carrier gas effects a gas exchange with the molten metal, and this gas mixture is pumped to the analyzer for measurement. In order to obtain an accurate and quick reading of the concentration of a gas in a molten metal, the carrier gas is pumped for one segment of a measuring cycle directly to the analyzer for calibration, as well as to the measuring circuit for purging and for uptake of the gas to be measured, so that the gas to be measured is ready for the analyzer. Hence, the carrier gas is pumped through the measuring circuit to at least one analyzer, and a partial pressure is calculated after the gas exchange in the molten metal, as a first approximate value for the partial pressure of the gas to be measured from the molten metal.
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