| 摘要 |
PURPOSE: To make it possible to execute patterning without an increase of working stages, disconnection of patterns in the boundary regions between non-phase shift regions and phase shift regions and formation of unnecessary patterns. CONSTITUTION: This phase shift mask is formed with exposure patterns by light shielding films 9 on a transparent substrate 1 and has the regions 8 where transmitted light is phase shifted by phase shifters 2 and the regions 9 where the transmitted light is not phase shifted in the light transmission regions not covered with the light shielding films 9. The phase shift mask has rectangular projecting parts 4 of a width below the resolution threshold of an exposure device to be to be used and a length above the resolution threshold at the ends of the phase shifters 2. |
