发明名称 METHOD FOR FORMING CONTACT PINS FOR SEMICONDUCTOR DICE AND INTERCONNECTS
摘要 A method for forming contact pins adapted to form an electrical connection with a mating contact location is provided. In a first embodiment, the contact pins are formed on an interconnect used for testing a semiconductor die and are adapted to establish an electrical connection with the bond pads of the die. In a second embodiment, the contact pins are formed directly on the bond pads of a die and can be used for establishing a permanent or temporary electrical connection to the pads. The contact pins include a base portion attached to the die or interconnect, a compliant spring segment, and a contact ball at the tip. The contact pins are formed using a wire bonding process or a welding process in which a metal wire is simultaneously heated and shaped into a compliant structure as it is attached to the die or interconnect.
申请公布号 WO9614659(A1) 申请公布日期 1996.05.17
申请号 WO1995US14482 申请日期 1995.11.06
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH, WARREN, M.;AKRAM, SALMAN;WOOD, ALAN, G.
分类号 H01L21/60;G01R1/06;G01R31/28;H01L21/607;H01L23/485;H01L23/49;H05K3/32 主分类号 H01L21/60
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