| 摘要 |
PURPOSE: To provide a removing solution for a photoresist which shows excellent removing performance and dissolving performance without containing a harmful component nor requiring a special rinsing liquid by mixing a specified compd. CONSTITUTION: This removing soln. is used to remove a photoresist film applied on a substrate. The soln. consists of 20-50wt.% aminoalcohol, 2-8wt.% water and 42-78wt.% glycol monoalkylether. As for the aminoalcohol, 1,2-aminoethanol, 1-amino-2-propanol, and 2-amino-1-propanol may be used, and especially 2- aminoethanol is preferable from an industrial point of view considering the removing performance and price. As for the glycolmonoalkyl ether, ethylene glycol monomethylether, ethylene glycol monoethylether, or diethylene glycol monobutylether may be used, and especially, diethylene glycol monobutyl ether is preferable. |
