Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity

摘要

A photo mask including a development rate measuring pattern having a plurality of lug-shape pattern dots arranged in a matrix on one of two equal parts of a predetermined region defined at a center portion of the photo mask, and a plurality of depression-shape pattern dots arranged in a matrix on the other part of the predetermined region; the pattern dots in either region being made of the same material as that of the photo mask and having a size gradually varying in a vertical matrix direction and in a horizontal matrix direction. Using the photo mask, it is possible to easily and rapidly measure the development rate uniformity of the development equipment used and to achieve an easy adjustment of the development rate of the development equipment, a simplified adjustment and a reduced adjustment time.