METHOD AND APPARATUS FOR DEPOSITING A SUBSTANCE WITH TEMPERATURE CONTROL

摘要

The present invention is directed to an apparatus and its method of use in which a substance such as diamond is deposited on a mandrel (110) or substrate (170), and where temperature at the deposition surface is controlled. According to one aspect of the invention, the temperature on the surface of a rotating mandrel (110) is controlled by passing coolant fluid radially through the mandrel at several angular reference positions in the mandrel, while a plasma containing, e.g., a hydrocarbon gas and hydrogen gas is directed toward the mandrel. A spacer (120) having a thermal conductance in its thickness direction that varies with its radial direction is mounted on the mandrel, and a substrate (170) is mounted on the spacer (120).