发明名称 ABSORBED MONOMOLECULAR FILM AND THE PREPARATION PROCESS
摘要 <p>The invention seeks to provide a method of forming a monomolecular film of fluorine-containing molecules on a substrate surface such that the film has an uniform thickness with minimal surface irregularities and is substantially pin hole free. The invention also provides for a substrate obtained by using the same method which has excellent water-and oil-repelling, anti-fogging, and anti-contaminating properties. The monomolecular film is formed on the substrate surface either directly or via a given protective film. The monomolecular film coating is characterized by a plurality of different chlorosilane-based surface active materials which are different in molecular length have a fluorine group. The surface irregularities of the film are generally confined to the molecular level. <IMAGE></p>
申请公布号 KR960006088(B1) 申请公布日期 1996.05.08
申请号 KR19910022572 申请日期 1991.12.10
申请人 MATSUSHITA ELECTRIC IND. K.K. 发明人 KAZUFUMI, OGAWA;TADASHI, OOTAKE;MAMORU, SOGA
分类号 B05D1/20;B05D1/18;B32B7/02;B32B9/00;C08J7/04;C09D4/00;C09K3/00;C09K3/18;(IPC1-7):C09D183/05 主分类号 B05D1/20
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