发明名称 METHOD AND DEVICE FOR INSPECTING DEFECT
摘要 PURPOSE: To easily discover the existence of defect with a glance of an observer so as to improve the inspection efficiency by superposing the sample pattern image, which is formed from the sample pattern, on the reference pattern image so as to form the observation image for observation. CONSTITUTION: The object light from a sample 1 on a stage 2 is transmitted through an objective lens group 3 provided with the predetermined magnification, and thereafter, enters into a beam splitter 6. The object light transmitted through the beam splitter 6 is focused at an intermediate focus position A1 as a sample pattern image by a focusing lens group 4. At the focus position A1, the reference pattern image, which is formed on the basis of the reference pattern, is focused in the superposed condition. The observation image formed of the sample pattern image and the reference pattern image is formed within the observation field of view of an eyepiece lens group 5, and all the observation image focused at the intermediate focus position A1 can be observed at the same time. Furthermore, the stage 2 is provided with an interference meter 15, and the observation position is detected by the interference meter 15, and a result of the detection is output to a control unit 12.
申请公布号 JPH08114554(A) 申请公布日期 1996.05.07
申请号 JP19940277174 申请日期 1994.10.18
申请人 NIKON CORP 发明人 MATSUMOTO TAKESHI;OKABE NOBUO
分类号 G01B11/24;G01N21/88;G01N21/93;G01N21/956;G06T1/00;G06T7/00;H01L21/66 主分类号 G01B11/24
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