发明名称 PRODUCTION OF RESIN COMPOSITION FOR DELUSTERED ELECTRODEPOSITION COATING
摘要 PURPOSE: To obtain a resin composition capable of forming electrodeposition coating film having stable, low-gloss and beautiful appearance and sufficient thickness and presenting excellent opacity and substrate die mark-hiding power. CONSTITUTION: This composition is obtained by incorporating 20-60 pts.wt. of an amino resin component in 40-80 pts.wt. of a copolymer component prepared by copolymerization of 10-60 pts.wt. of the mixed monomer component described below in the presence of 40-90 pts.wt. of a water-soluble or water- dispersible vinyl copolymer component bearing both carboxyl and hydroxyl groups on the side chain followed by blending the resultant system with 0.5-4.0 pts.wt. of a wax component. A total 100 pts.wt. of the mixed monomer component is composed of (a) such a pts.wt. of anα,β-ethylenic unsaturated carboxylic acid hydroxyalkyl-contg. ester monomer as to be >=20 in the hydroxyl value of the mixed monomer component, (b) 1-10 pts.wt. of anα,β-ethylenic unsaturated carboxylic alkoxysilane group-cont. ester monomer and (c) the rest of a copolymerizable vinyl group-contg. monomer free from carboxyl group.
申请公布号 JPH08113735(A) 申请公布日期 1996.05.07
申请号 JP19940125853 申请日期 1994.05.17
申请人 HONNY CHEM IND CO LTD 发明人 YOSHIDA SHOJI;KAGAWA MINORU
分类号 C09D5/00;C09D5/44;C09D151/00;C09D151/06;C09D161/20;(IPC1-7):C09D5/44 主分类号 C09D5/00
代理机构 代理人
主权项
地址