发明名称 MANUFACTURING EQUIPMENT FOR ALLOY THICK FILM HAVING HYDROGEN ABSORBING FUNCTION AND ITS METHOD
摘要 PURPOSE: To provide hydrogen storage alloy thick film manufacturing equipment capable of forming an alloy thick film having a thickness of 1μm or more and having a hydrogen absorbing function. CONSTITUTION: Lanthanum vapor and nickel vapor are generated from boats 2, 3 heated by electron beams 4, 5 and moved to an RF coil 9. Lanthanum vapor and nickel vapor are RF-excited in the RF coil and converted into plasma, then after a specified kinetic energy is given, the plasma is irradiated to a nickel substrate 6. At the same time, hydrogen ions are irradiated to the nickel substrate from an ion gun 10. A film by binary simultaneous vapor deposition of lanthanum and nickel is formed on the surface of the nickel substrate.
申请公布号 JPH08115721(A) 申请公布日期 1996.05.07
申请号 JP19940252467 申请日期 1994.10.18
申请人 MITSUBISHI MATERIALS CORP 发明人 SUGIHARA TADASHI;MACHINO TAKESHI;MIZUGUCHI AKIO
分类号 C22C1/00;B81C1/00;C23C14/32;C23C16/50;C23C30/00;H01M4/26 主分类号 C22C1/00
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