发明名称 |
MANUFACTURING EQUIPMENT FOR ALLOY THICK FILM HAVING HYDROGEN ABSORBING FUNCTION AND ITS METHOD |
摘要 |
PURPOSE: To provide hydrogen storage alloy thick film manufacturing equipment capable of forming an alloy thick film having a thickness of 1μm or more and having a hydrogen absorbing function. CONSTITUTION: Lanthanum vapor and nickel vapor are generated from boats 2, 3 heated by electron beams 4, 5 and moved to an RF coil 9. Lanthanum vapor and nickel vapor are RF-excited in the RF coil and converted into plasma, then after a specified kinetic energy is given, the plasma is irradiated to a nickel substrate 6. At the same time, hydrogen ions are irradiated to the nickel substrate from an ion gun 10. A film by binary simultaneous vapor deposition of lanthanum and nickel is formed on the surface of the nickel substrate. |
申请公布号 |
JPH08115721(A) |
申请公布日期 |
1996.05.07 |
申请号 |
JP19940252467 |
申请日期 |
1994.10.18 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
SUGIHARA TADASHI;MACHINO TAKESHI;MIZUGUCHI AKIO |
分类号 |
C22C1/00;B81C1/00;C23C14/32;C23C16/50;C23C30/00;H01M4/26 |
主分类号 |
C22C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|