发明名称 |
Compound semiconductor single-crystalline substrate for liquid phase epitaxial growth |
摘要 |
The disclosed compound semiconductor single-crystalline substrate for liquid phase epitaxial growth has a relatively low cost and excellent practicality. This compound semiconductor single-crystalline substrate has a surface roughness of at least 1 mu m and not more than 10 mu m as measured over a line of 1 mm length. This substrate is employed as a substrate for an epitaxial wafer for an infrared- or visible light-emitting diode. Due to its particular roughness, the substrate can be prevented from slipping or falling while it is transported during processing. Furthermore, no lapping and polishing are required for manufacturing the substrate. Thus, the substrate for liquid phase epitaxial growth can be provided at a relatively low cost.
|
申请公布号 |
US5514903(A) |
申请公布日期 |
1996.05.07 |
申请号 |
US19950400271 |
申请日期 |
1995.03.03 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
INOUE, TETSUYA;OTSUKI, MAKOTO;YOKOTA, TETSUICHI |
分类号 |
H01L21/208;H01L29/06;(IPC1-7):H01L29/06 |
主分类号 |
H01L21/208 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|