Wet scrubber for cleaning e.g. acid-laden gases generated in the laboratory
摘要
A gas cleaning device has a chamber into which the gas flows and in which is located a spray nozzle for a liq. supplied from the chamber to the nozzle. An inlet passage (78) for the gas to be cleaned discharges downwards into a chamber (38) through which the gas flows substantially horizontally before leaving vertically through a third passage (80).
申请公布号
DE4438686(A1)
申请公布日期
1996.05.02
申请号
DE19944438686
申请日期
1994.10.29
申请人
FRIATEC AG KERAMIK- UND KUNSTSTOFFWERKE, 68229 MANNHEIM, DE
发明人
HEIDENREICH, HUBERT, 68239 MANNHEIM, DE;CUNTZ, HANS PETER, 68775 KETSCH, DE;WERNER, ROLAND, 67550 WORMS, DE
