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发明名称
Negativ arbeitende Photoresistzusammensetzung
摘要
申请公布号
DE69301985(D1)
申请公布日期
1996.05.02
申请号
DE19936001985
申请日期
1993.08.19
申请人
SUMITOMO CHEMICAL CO., LTD., OSAKA, JP
发明人
UEDA, YUJI, IZUMI-SHI, JP;TAKEYAMA, NAOKI, SETTSU-SHI, JP;UEKI, HIROMI, MISHIMA-GUN, OSAKA, JP;KUSUMOTO, TAKEHIRO, TAKARAZUKA-SHI, JP;NAKANO, YUKO, IBARAKI-SHI, JP
分类号
G03F7/004;G03F7/029;G03F7/038;H01L21/027;(IPC1-7):G03F7/038
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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