发明名称 Narrow band emission laser, esp. excimer laser for microlithography
摘要 The laser has a laser resonator contg. a laser active medium (10), at least one highly reflective mirror (12), and wavelength selective elements (14,22). Also provided are at least one beam expansion lens (16) and one optical element (18) to rotate the polarisation plane of the beam. The laser resonator can contain a Fabry-Perot etalon (22) as a wavelength selective element, a polarising beam divider, a grid, beam expander and polarisation plane rotation element. The optical element used to rotate the polarisation plane can be a Faraday rotator. The polarising beam divider is arranged to maximally reflect the s-components and maximally pass the p-components of the beam.
申请公布号 DE4438283(A1) 申请公布日期 1996.05.02
申请号 DE19944438283 申请日期 1994.10.26
申请人 LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH, 37079 GOETTINGEN, DE 发明人 BASTING, DIRK, DR., 37079 GOETTINGEN, DE;KLEINSCHMIDT, JUERGEN, DR., 06667 WEISENFELS, DE
分类号 G02B5/18;G02F1/09;G03F7/20;H01L21/027;H01S3/08;H01S3/098;H01S3/10;H01S3/105;H01S3/1055;H01S3/106;H01S3/134;H01S3/225;(IPC1-7):H01S3/08;H01S3/107;H01S3/227 主分类号 G02B5/18
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