发明名称 THICK FILM EQUILIBRIUM PROCESS AND DEVICE
摘要 There is disclosed a method for removing a volatile component from a feed or process stream comprising (1) absorbing or adsorbing the volatile component into an absorbent or adsorbent material in an equilibrium process, wherein feed is pumped through a mixture chamber of a device, wherein the device comprises the mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of films comprising absorbent or adsorbent materials, wherein the film is configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, and (2) removing the volatile component from the absorbent or adsorbent material by applying heat to the mixture chamber and simultaneously applying a gas phase within the vapor chamber such that the volatile component is collected in a gaseous state in the vapor chamber. There is further disclosed a device for removing a volatile component from a feed comprising an enclosed two-chambered device having a mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of absorbent or adsorbent materials configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, wherein the absorbent or adsorbent materials comprise a thick film having a thickness of from about 0.1 mm to about 5 mm thick with optional protuberances.
申请公布号 EP0695210(A4) 申请公布日期 1996.05.01
申请号 EP19940914206 申请日期 1994.04.18
申请人 ENVIROSEP, INC. 发明人 SCHOFIELD, RICHARD, W.
分类号 B01D15/00;B01D53/04;B01D53/22;B01D61/00;B01D61/36;B01D63/06;B01D63/08;B01J20/26;B01J20/30 主分类号 B01D15/00
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