发明名称 |
Exposure method for an image forming apparatus, and image forming apparatus |
摘要 |
<p>An exposure method which has a step of offsetting a first scanning line bend by scanning means with a second scanning line bend by an image forming lens, and/or a step of correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected. An image forming apparatus which has an image forming lens for producing a second scanning line bend is so as to offset a first scanning line bend by scanning means, and/or correcting means for correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected. <IMAGE></p> |
申请公布号 |
EP0709707(A2) |
申请公布日期 |
1996.05.01 |
申请号 |
EP19950110345 |
申请日期 |
1995.07.03 |
申请人 |
FUJITSU LIMITED |
发明人 |
SUGANO, TAKAO;IWASA, MASAYUKI;OGAWA, KAZUKI |
分类号 |
B41J2/44;G02B26/12;H04N1/113;(IPC1-7):G02B26/10;H04N1/04 |
主分类号 |
B41J2/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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