发明名称 Exposure method for an image forming apparatus, and image forming apparatus
摘要 <p>An exposure method which has a step of offsetting a first scanning line bend by scanning means with a second scanning line bend by an image forming lens, and/or a step of correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected. An image forming apparatus which has an image forming lens for producing a second scanning line bend is so as to offset a first scanning line bend by scanning means, and/or correcting means for correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected. &lt;IMAGE&gt;</p>
申请公布号 EP0709707(A2) 申请公布日期 1996.05.01
申请号 EP19950110345 申请日期 1995.07.03
申请人 FUJITSU LIMITED 发明人 SUGANO, TAKAO;IWASA, MASAYUKI;OGAWA, KAZUKI
分类号 B41J2/44;G02B26/12;H04N1/113;(IPC1-7):G02B26/10;H04N1/04 主分类号 B41J2/44
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