| 摘要 |
PURPOSE: To produce an optical thin film at a high speed by bombarding steam generated from a film raw material with accelerated ions and allowing the accelerated film raw material to arrive at the substrate. CONSTITUTION: The inside of a vacuum tank 1 is exhausted, and a gas of Ar or the like is introduced therein from a gas introducing port 6. A Ti sheet 3 as a film raw material is heated to about 1200 deg.C, and Ti steam is made present in the vicinity of the upper direction of the sheet 3. At the time of applying the accelerated Ar ions from an ion gun 5, Ti steam is sputtered. Then, at the time of opening a shutter 7, a Ti film is formed on a substrate 2. Thus, the film forming rate is accelerated. The adhesion and hardness of the formed film are sufficient. As the film raw material, granular SiO and MgF2 as well as the Si sheet 3 can be utilized. |
