| 摘要 |
PURPOSE: To make uniform the thermal expansion of a pattern mask by providing two mask patterns on the surface and rear, on the periphery of an alignment mark, with shade patterns having same shape as the image parts on the surface and rear. CONSTITUTION: When predetermined patterns are baked by proximity exposure onto the surface and rear of an etching component material metal plate 4 applied with a photosensitive resin layer onto the opposite sides thereof, pattern masks 2 on the surface and rear are provided, on the periphery of an alignment mark, with shading hole patterns 6 having same shape as the image parts 8 on the surface and rear at same pitch and density as the image part 8. Consequently, the light absorption rate per unit area can be made uniform at the peripheral part of the alignment mark 1 and the image part 8 at the time of baking a pattern. |
