发明名称 |
Method of making thin-layer component |
摘要 |
The present invention relates to a thin-layer component having a thin layer of (100)-oriented platinum or the other metals in Group VIII, which is formed on amorphous silicon dioxide, and further relates to a thin-layer producing system for producing such thin-layer components, the thin-layer producing system being a sputtering system wherein an auxiliary electrode is provided between two electrodes.
|
申请公布号 |
US5512151(A) |
申请公布日期 |
1996.04.30 |
申请号 |
US19940255886 |
申请日期 |
1994.06.07 |
申请人 |
MINOLTA CAMERA KABUSHIKI KAISHA |
发明人 |
HAYAMIZU, SHUNICHI;MIYAURA, TOMOKO;SAEKI, NOBORU |
分类号 |
C23C14/06;C23C14/18;C23C14/34;C30B23/08;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|