PATTERN FORMING APPARATUS OF PHOTOMASKING EQUIPMENTS

摘要

The device is to supply a photomasking equipments which can modify a pattern easily by modifying the pattern of a mask temporally. The device comprises: a liquid mask which is distributed between the lamp of the photo-masking equipments and the wafer, forming variable mask patterns by the electrical action; a liquid activating unit which activates liquid mask; a data input unit which inputs the layout pattern data of the device so that the liquid activating unit can activate the liquid mask.