Belichtungsmaske für ein Halbleiterplättchen und Belichtungsverfahren.

摘要

For exposing a wafer with radiation, a radiation exposure mask (10) is provided with at least two radiaiton exposure windows (A...D) each including mask pattern (1) of a small pattern area obtained by dividing a pattern area constituting an integrating circuit chip (11) to a plurality of small areas. A semiconductor wafer is exposed with radiation while the radiation exposure mask (10) is intermittently moved by a distance of the size of the small pattern area.